Sapteka, ...., 		Narottama, ...., & 		Yasa, ....
(2020).
Modelling of Phosphorus and Boron Doping Concentration on SOI Wafer Based Diffusion Process.
<em>Logic : Jurnal Rancang Bangun Dan Teknologi, 20</em>(1), 53-58.
doi:10.31940/logic.v20i1.1748